The 6th of February 2019, the Spanish Patent and Trademark Office (OEPM) has published its new Examination Guidelines for Patents, Utility Models, Topographies of Semiconductors and Industrial Designs. They are the most complete published so far, and cover the different modalities of protection for inventions and designs. The guidelines will be very useful for applicants and their representatives for the filing, prosecution and grant of these of Industrial Property rights. The Guidelines will help in unify the practice applied by the OEPM and its examiners, and better understand the criteria they apply. We appreciate the vocation of service and transparency of the OEPM, and its adaptation to present and future technological, sectors.
You can find the Examination Guidelines here.